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During the cleaning of semiconductor wafers, which are typically made of silicon, the semiconductor wafer is held in a cassette, which is moved through a cleaning and/or rinsing station. The cassette will generally hold a plurality of wafers, such as 24 wafers for example.
Depending on the process, the cleaning and/or rinsing station may be provided with a number of processing units. A typical processing unit comprises a processing chamber, in which the wafers are to be cleaned and/or rinsed, and a rinsing and/or washing unit, which is provided with a flow of a rinsing and/or washing fluid.
The flow of the fluid is deflected out of the flow in the region of the wafer by means of a swirl-generating plate, so that the flow of the fluid forms a circumferential flow around the wafer. This circumferential flow exerts a certain pressure on the wafer, which may lead to damage of the wafer. 827ec27edc